Dr. Samrina Sahir completed her Bachelor’s degree in Metallurgical and Materials Engineering from the University of Engineering and Technology, Lahore. She was selected for a five year MS leading to PhD program Under HRDI-UESTP HEC Scholarship (2017-2022). In this scholarship program she has worked on the interaction of ceria particles with oxide and PVA brush during the CMP process under the supervision of Prof. Jin-Goo Park at Hanyang University, South Korea. Her doctoral research work was on the consumables of chemical mechanical planarization processes involved in semiconductor processing. She has a vast experience on several material characterization techniques using Field Emission Scanning Electron Microscope, Zeta-potential and Particle Size Analyzer, Optical Reflectometer, Four-Point Probe, Optical Microscopy, Fourier Transformation Infrared Spectroscopy (FTIR), Contact Angle Analyzer, Electrochemical Analysis using Potentiostat and UV-Vis Spectrometer.
She has been indulged in advanced materials research in the field of materials science and engineering since 2017. Her areas of research include processes involved in manufacturing semiconductor devices such as Chemical Mechanical Planarization (Metal and STI CMP), post CMP cleaning involving brush scrubbing, megasonic cleaning, and chemical cleaning processes for CMP residues removal, and investigation of abrasives nature and properties used in CMP.
She has published numerous research papers in international journals of repute with high impact factors and citations. Also, she has presented her research work in several renowned international conferences in Europe, USA, Japan, Taiwan and South Korea.
08 International Publications in ISI indexed journals, impact factor of 32, citations 86, h-index 5: